This workshop is the 9th in a series devoted to plasma etch and strip processes for micro, nano and bio- technologies. This year’s workshop also addresses new and challenging topics in the field of emerging nanoscale devices such as MEMS/NEMS, optronics devices and 3D Integration. The workshop will also be open to new topics like plasma for biotechnology.

The objective of the workshop is to provide a forum for open discussions between science and industrial application. It is dedicated to scientists, process engineers and Ph-D students. Topics include both fundamental and applied research, as well as issues related to introduction into manufacturing, with the progressive downscaling of device dimensions and the simultaneous demand for more functionality.

Invited talks will be given by scientific and technical leaders in each of the key areas to present the current state-of-the-art and to stimulate technical discussions.

Opening for registration: January 4, 2016

Abstracts are due: February 29, 2016  March 15th, 2016

Notification of authors: March 31, 2016