Confirmed Invited Speakers:

-          T. Lill (Lam Research): “Surface Science Aspects of Atomic Layer Etching”
-          F. Laermer (Bosch): “Deep Silicon Etching shaping MEMS”
-          E. Despiau-Pujo (CNRS-LTM) :  “Plasma solutions for nanometric-precision etching: insights from MD simulations”
-          D. O'Connell (University of York): "The influence of changing surface conditions on electron heating in plasmas"
-          F.Rossi (Institute for Health and Consumer Protection): “Applications and challenges of plasma processes in NanoBioTechnology”
-          C.Labelle (Global Foundries): “Etch challenges for FEOL Patterning”